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Particle lithography by immersion of latex-masked substrates in silane solutions A completely different morphology other than rings or nanopores was observed for OTS nanostructures produced by the immersion of particle masks.
To develop robust and reproducible lithography procedures with OTS, parameters, such as temperature, humidity, solvents, physical deposition conditions, and mask materials, can be systematically changed to enable nanoscale studies of surface assembly.
Particle lithography with vapor deposition of OTS produced multilayered ring nanostructures surroun Nanopatterns of octadecyltrichlorosilane OTS were prepared on surfaces of Si using designed protocols of particle lithography combined with either vapor deposition, immersion, or contact printing.
The center-to-center spacing between the ring structures is approximately nm, which matches the diameter of the latex mask. The location of water residues on the surface defines the sites for OTS binding; for example, with the more hydrophilic substrate of mica attachment to the interstitial areas of the surface between spheres was observed for latex masks that were briefly dried .
Contact-mode AFM images are shown A similar height was produced by using the immersion of annealed latex masks. The cursor profile shows that the areas surrounding the rings and inside the rings are nearly the same height, where the height scale refers to the baseline of the uncoated substrate.
The dimensions and circular shapes of the nanostructures correspond to highly regular circles of consistent heights. Changing the physical approaches for applying molecules to masked surfaces produced OTS nanostructures with different shapes and heights.
Results and Discussion A comparison of the geometries and thicknesses of the nanostructures produced by particle lithography was used to systematically investigate parameters for surface self-assembly of octadecyltrichlorosilane OTS.
Molecular-level differences in the thickness and morphology of OTS nanostructures prepared by different lithography procedures can be investigated by performing atomic force microscopy AFM studies [52,53].
The surface self-assembly of organosilanes such as octadecyltrichlorosilane OTS is complicated, with multiple steps of hydrolysis, cross-linking and silanation . Particle lithography enables control of the deposition parameters for tailoring the surface coverage, surface geometries and pattern dimensions.
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